Abstract

GALEANO-OSORIO, Diana Shirley et al. Carbon nitride films grown by cathodic vacuum arc for hemocompatibility applications. Dyna rev.fac.nac.minas [online]. 2014, vol.81, n.186, pp.94-101. ISSN 0012-7353.  https://doi.org/10.15446/dyna.v81n186.39121.

Amorphous carbon nitride films have been obtained by pulsed cathodic arc at substrate temperatures of 20, 100, 150 and 200 °C. Film structure was investigated by Fourier Transformed infrared spectroscopy (FTIR) and Raman spectroscopy. Nitrile bands at approximately 2200 cm^-1 were identified in all films. As the temperature increased a reduction in the concentration of sp³ bonds and a decrease in the structure disorder were observed. The relative intensity ratio of Raman D and G bands increased as the substrate temperature increased from  20 to 100°C. Nevertheless, at a critical temperature of 150°C, this trend was broken, and the film became amorphous. A peak at approximately 1610 cm^-1 of films grown at 100°C, 150°C and 200 °C suggests that CNx is dominated by a relatively ordered graphite ring like glassy carbon. Moreover, the film grown at 150 °C presented the lowest roughness and the highest hardness and hemocompatibility

Keywords : Carbon nitride films; Raman spectroscopy; FTIR spectroscopy; substrate temperature.

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